Informaçao sobre o Autor

Мяконьких, А. В.

Edição	Seção	Título	Arquivo
Volume 53, Nº 1 (2024)	TECHNOLOGIES	Application of Spectral Ellipsometry for Dielectric, Metal and Semiconductor Films in Microelectronics Technology
Volume 53, Nº 1 (2024)	TECHNOLOGIES	Parameters and Composition of Plasma in a Mixture of CF₄ + H₂ + Ar: Effect of the CF₄/H₂ Ratio
Volume 52, Nº 4 (2023)	TECHNOLOGIES	Mechanisms of the Redistribution of Carbon Contamination in Films Formed by Atomic Layer Deposition
Volume 53, Nº 6 (2024)	DIAGNOSTICS	Gas Phase Composition and Fluorine Atom Kinetics in SF₆ Plasma